Dr. S.V. Sreenivasan is the Cockrell Family Regents Endowed Chair #7 in Engineering at The University of Texas at Austin. He is a nanotechnologist with an interest in creating high throughput nanofabrication techniques for applications in emerging electronics, displays, and healthcare sectors. He has published over 130 technical articles and holds over 100 U.S. patents in the area of scalable nanotechnologies. Dr. Sreenivasan is the director of the NASCENT Center (https://nascent.utexas.edu/), a National Science Foundation funded Nanosystems Engineering Research Center. NASCENT Center is an interdisciplinary research effort in the area of high throughput nanomanufacturing systems.

Dr. Sreenivasan co-founded Molecular Imprints Inc. (MII), a nanopatterning spin out from UT-Austin. He currently serves as the Chief Technologist of Canon Nanotechnologies, Inc., a company formed as a result of the acquisition of the semiconductor business of MII by Canon Corporation in 2014. Additionally, the display division of MII was acquired in 2015 by Magic Leap, Inc., a leader in augmented/mixed reality displays.

Dr. Sreenivasan has received several awards for his work including Technology Pioneer Award by the World Economic Forum (2005), University of Texas Chancellors' Award for Entrepreneurship (2007), The ASME Leonardo da Vinci Award (2009), The TAMEST O'Donnell Award for Technology Innovation (2010), the ASME William T. Ennor Manufacturing Technology Award (2011), the UT-Austin Inventor of the Year Award (2012), Distinguished Alumni Award by the National Institute of Technology at Trichy in India (2014), Distinguished Alumni Award by the College of Engineering at The Ohio State University (2016), and the ASME Machine Design Award (2017). Dr. Sreenivasan was named Fellow of the National Academy of Inventors in 2016, Fellow of ASME in 2020, and was elected as a Member of the National Academy of Engineering in 2021.

Selected Publications

1. A. Mallavarapu, P. Ajay, C. Barrera, S.V. Sreenivasan, S.V., “Ruthenium Assisted Chemical Etching of Silicon – Enabling CMOS-Compatible 3D Semiconductor Device Nanofabrication,” ACS Applied Materials & Interfaces, 2021 13 (1), 1169-1177, DOI: 10.1021/acsami.0c17011
2. A. Sayal, P. Ajay, M. W. McDermott, S. V. Sreenivasan and J. P. Kulkarni, "M2A2: Microscale Modular Assembled ASICs for High-Mix, Low-Volume, Heterogeneously Integrated Designs," in IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, Published Online on 23rd March 2020, doi: 10.1109/TCAD.2020.2982621.
3. Brent Snyder, Mia Yang, Shrawan Singhal, Ovadia Abed, S.V. Sreenivasan, "Automated tuning of high-order waveforms for picoliter resolution jetting of rheologically challenging materials," Precision Engineering, 2019, Vol. 56, Pages 143-155.
4. A. Cherala and S. V. Sreenivasan, "Molecular dynamics modeling framework for overcoming nanoshape retention limits of imprint lithography," Microsystems & Nanoengineering, Nature Publishing Group, Volume 4, Article number 3 (April 2018), https://doi.org/10.1038/s41378-018-0007-4.
5. S.V. Sreenivasan, “Nanoimprint lithography steppers for volume fabrication of leading-edge semiconductor integrated circuits,” Microsystems & Nanoengineering, Nature Publishing Group, Vol. 3, Article number: 17075 (2017), doi:10.1038/micronano.2017.75